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Ellipsometry is an optical non destructive technique allowing the accurate characterization of thin films, surface and interface. It is capable of determining layer thickness from 1Å to tens of microns, optical constants, composition, anisotropy, crystallinity and uniformity.

Spectroscopic Ellipsometers

Unique technologies providing the most sensitive, accurate measurement along with advanced thin film characterization capabilities.

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In-Situ and In-Line Ellipsometers

High precision, high speed monitoring and control of thin film deposition or etch processes.

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Thin Film Quality Control

NEW: Thin film thickness and optical constants in one click !

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Fully Automated Ellipsometers

Designed for the semiconductor industry allowing reliable in-line process control and high yield production.

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Large Area Metrology Systems

Designed for the display industry, capable to handle up to 7^th generation display substrates.

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Software

DeltaPsi2 is a new generation of software based on a common GUI frame, and has been designed to provide intuitive and comprehensive user interaction with the system. The multitasking software provides the ultimate in versatility for use in ex-situ and in-situ configurations as well as the ability to drive fully automatic ellipsometers.

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